The June 2000 conference was held at the National Institute of Standards and Technology and brought together leaders, scientists, and engineers concerned with all aspects of technology, characterization techniques, and metrology for silicon research. The collected papers provide an overview of industry metrology and characterization needs and the problems faced by industry, academia, and government to continue the dramatic progress in semiconductor technology as the industry moves toward chips with feature sizes less than 100 nm. A CD-ROM version of the proceedings is included. Annotation c. Book News, Inc., Portland, OR (booknews.com)
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing.This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of the process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics.It provides a concise and effective portrayal of industry characterization needs and some of the problems that must be addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. It also provides a basis for stimulating practical perspectives and new ideas for research and development.
