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Part I Introductory Concepts, Characterization and Optimization Strategies |
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1 Fundamentals of Femtosecond Laser Modification of Bulk Dielectrics |
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3 | (16) |
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3 | (1) |
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1.2 Femtosecond Laser-Material Interaction |
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4 | (7) |
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1.2.1 Free Electron Plasma Formation |
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4 | (3) |
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1.2.2 Relaxation and Modification |
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7 | (4) |
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1.3 Exposure Variables and Considerations |
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11 | (5) |
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11 | (2) |
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13 | (1) |
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1.3.3 Influence of Exposure Variables Within Low- and High-Repetition Rate Regimes |
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14 | (2) |
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16 | (3) |
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16 | (3) |
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2 Imaging of Plasma Dynamics for Controlled Micromachining |
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19 | (24) |
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19 | (1) |
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2.2 Assessment of the Interaction of Ultrashort Pulses with Dielectrics Using Optical Probes |
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20 | (7) |
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2.2.1 Interaction Mechanisms and Characteristic Time Scales |
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20 | (2) |
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2.2.2 Time-resolved Optical Techniques |
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22 | (1) |
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2.2.3 Exploiting Spatial Resolution |
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23 | (2) |
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2.2.4 Basic Models for Quantitative Analysis of Experimental Data |
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25 | (2) |
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2.3 Ultrafast Imaging at the Surface of Dielectrics |
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27 | (5) |
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2.3.1 Experimental Configurations and Constraints |
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27 | (2) |
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2.3.2 Transient Plasma Dynamics and Permanent Material Modifications |
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29 | (3) |
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2.4 Ultrafast Imaging in the Bulk of Dielectrics |
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32 | (6) |
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2.4.1 Experimental Configurations and Constraints |
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32 | (3) |
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2.4.2 Transient Plasma Dynamics in Glasses Under Waveguide Writing Conditions: Role of Pulse Duration, Energy, Polarization, and Processing Depth |
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35 | (3) |
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2.5 Outlook and Conclusions |
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38 | (5) |
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40 | (3) |
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3 Spectroscopic Characterization of Waveguides |
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43 | (24) |
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43 | (1) |
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3.2 Spectroscopic Analysis of Glass |
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44 | (5) |
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3.2.1 Fluorescence Spectroscopy |
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44 | (3) |
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47 | (2) |
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49 | (1) |
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3.3 Experimental Equipment and Procedures |
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49 | (3) |
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3.3.1 Femtosecond Laser Systems and Micromachining Procedures |
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50 | (1) |
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3.3.2 Confocal Microscope System and Spectroscopy Procedures |
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51 | (1) |
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3.4 Spectroscopic Analysis of fs-laser Modification in Fused Silica |
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52 | (5) |
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3.4.1 Fluorescence Spectroscopy and Imaging of Waveguides and Bragg Gratings |
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52 | (3) |
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3.4.2 Photobleaching of Defects |
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55 | (1) |
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3.4.3 Raman Spectroscopy and Imaging |
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55 | (2) |
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3.5 Spectroscopic Analysis of Waveguides in Phosphate Glasses |
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57 | (6) |
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3.5.1 Fluorescence Spectroscopy and Imaging of IOG-1 |
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57 | (2) |
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3.5.2 Comparison of Waveguides in Fused Silica and IOG-1 |
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59 | (1) |
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3.5.3 Raman Spectroscopy and Imaging of Rare Earth-doped Phosphate Glass |
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60 | (3) |
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63 | (4) |
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63 | (4) |
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4 Optimizing Laser-Induced Refractive Index Changes in Optical Glasses via Spatial and Temporal Adaptive Beam Engineering |
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67 | (26) |
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67 | (2) |
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4.2 Mechanisms of Laser-Induced Refractive Index Changes |
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69 | (4) |
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4.3 Experimental Implementations for Pulse Engineering |
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73 | (3) |
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4.3.1 Spatio-Temporal Beam Shaping |
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73 | (2) |
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4.3.2 Microscopy Based Adaptive Loops |
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75 | (1) |
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4.4 Material Interaction with Tailored Pulses |
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76 | (11) |
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4.4.1 Refractive Index Engineering by Temporally Tailored Pulses |
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76 | (2) |
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4.4.2 Energy Confinement and Size Corrections |
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78 | (2) |
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4.4.3 Adaptive Correction of Wavefront Distortions |
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80 | (4) |
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4.4.4 Dynamic Parallel Processing |
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84 | (3) |
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4.5 Outlook and Conclusions |
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87 | (6) |
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88 | (5) |
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5 Controlling the Cross-section of Ultrafast Laser Inscribed Optical Waveguides |
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93 | (34) |
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93 | (1) |
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5.2 The Effect of the Waveguide Cross-section on the Properties of the Guided Modes |
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94 | (3) |
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5.3 The Importance of Controlling the Waveguide Cross-section from a Device Engineering Perspective |
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97 | (3) |
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5.3.1 Effect of Mode Field Distribution on Waveguide Coupling Loss |
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97 | (1) |
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5.3.2 Effect of Mode Field Distribution on Waveguide Propagation Loss |
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98 | (1) |
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5.3.3 Effect of Mode Field Distribution on Evanescent Coupling |
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99 | (1) |
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5.3.4 Effect of Waveguide Asymmetry on Polarisation Dependent Guiding Properties |
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100 | (1) |
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5.4 Experimental Techniques for Measuring the Refractive Index Profile of Ultrafast Laser Inscribed Waveguides |
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100 | (5) |
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5.4.1 Refracted Near-field (RNF) Method |
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100 | (1) |
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101 | (1) |
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5.4.3 Quantitative Phase Microscopy |
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102 | (2) |
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5.4.4 Inverse Helmholtz Technique |
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104 | (1) |
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5.5 Effect of Inscription Parameters on the Waveguide Cross-section |
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105 | (3) |
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5.6 Experimental Techniques for Controlling the Waveguide Cross-section |
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108 | (13) |
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5.6.1 The Astigmatic Beam Shaping Technique |
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108 | (3) |
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5.6.2 The Slit Beam Shaping Technique |
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111 | (3) |
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5.6.3 Waveguide Shaping Using Active Optics |
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114 | (4) |
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5.6.4 Spatiotemporal Focussing |
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118 | (2) |
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5.6.5 The Multiscan Technique |
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120 | (1) |
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5.7 Conclusions and Outlook |
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121 | (6) |
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122 | (5) |
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6 Quill and Nonreciprocal Ultrafast Laser Writing |
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127 | (28) |
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128 | (1) |
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128 | (9) |
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6.3 Anisotropic Bubble Formation |
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137 | (2) |
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6.4 Nonreciprocal Writing |
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139 | (10) |
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149 | (6) |
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150 | (5) |
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Part II Waveguides and Optical Devices in Glass |
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7 Passive Photonic Devices in Glass |
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155 | (42) |
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155 | (2) |
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7.2 Characterization of Femtosecond Laser-Written Waveguides |
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157 | (4) |
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7.2.1 Microscope Observation |
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158 | (1) |
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158 | (1) |
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7.2.3 Mode Profile and Coupling Loss |
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159 | (1) |
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160 | (1) |
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7.2.5 Refracted Near Field Method |
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161 | (1) |
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7.3 Femtosecond Laser Microfabrication of Optical Waveguides |
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161 | (11) |
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7.3.1 Low-Repetition Rate Regime |
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162 | (2) |
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7.3.2 High-Repetition Rate Regime |
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164 | (8) |
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172 | (20) |
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173 | (2) |
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7.4.2 Directional Couplers |
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175 | (11) |
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7.4.3 Mach-Zehnder Interferometers |
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186 | (1) |
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186 | (6) |
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7.5 Summary and Future Outlook |
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192 | (5) |
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193 | (4) |
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8 Fibre Grating Inscription and Applications |
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197 | (30) |
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197 | (2) |
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8.2 Review of Gratings Types |
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199 | (3) |
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8.2.1 Long Period Gratings |
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199 | (1) |
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8.2.2 Fibre Bragg Gratings |
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200 | (2) |
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8.3 Point-by-Point Inscribed Gratings |
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202 | (4) |
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8.3.1 Fabrication Methods |
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202 | (2) |
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8.3.2 Development of Femtosecond Laser Direct-Write LPGs |
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204 | (1) |
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8.3.3 Development of Femtosecond Laser Direct-Write FBGs |
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205 | (1) |
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8.4 Phase Mask Inscribed Gratings |
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206 | (3) |
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206 | (1) |
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8.4.2 Development of Femtosecond Laser-Phase Mask Inscription |
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207 | (2) |
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8.5 Properties of Femtosecond Laser Written Gratings |
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209 | (7) |
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209 | (3) |
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8.5.2 Stress and Birefringence |
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212 | (2) |
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214 | (2) |
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216 | (4) |
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216 | (2) |
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218 | (2) |
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220 | (1) |
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8.7 Novel Fibre Types and Challenges |
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220 | (2) |
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8.7.1 Microstructured Optical-Fibres (MOFs) |
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220 | (2) |
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8.7.2 Polymer and Non-linear Fibres |
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222 | (1) |
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8.7.3 Through Jacket Grating Writing |
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222 | (1) |
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222 | (5) |
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223 | (4) |
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9 3D Bragg Grating Waveguide Devices |
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227 | (38) |
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227 | (3) |
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9.2 Bragg Grating Waveguide Fabrication |
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230 | (17) |
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9.2.1 BGW Fabrication Method 1: Single-pulse Writing |
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231 | (7) |
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9.2.2 BGW Fabrication Method 2: Burst Writing |
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238 | (6) |
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9.2.3 BGW Thermal Stability |
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244 | (3) |
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247 | (12) |
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9.3.1 Multi-wavelength BGWs |
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247 | (3) |
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250 | (3) |
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9.3.3 3D BGW Sensor Network |
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253 | (6) |
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9.4 Summary and Future Outlook |
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259 | (6) |
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261 | (4) |
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10 Active Photonic Devices |
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265 | (30) |
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265 | (1) |
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10.2 Active Ions for Waveguide Devices |
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266 | (4) |
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10.3 Gain Definitions and Measurement Technique |
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270 | (7) |
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10.3.1 Definition of the Main Figures of An Active Waveguide |
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270 | (4) |
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10.3.2 The On/Off Technique for Gain Measurement |
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274 | (3) |
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10.4 Active Waveguides and Amplifiers |
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277 | (4) |
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10.4.1 Internal Gain in Nd-Doped Active Waveguides |
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277 | (1) |
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10.4.2 Waveguide Amplifier in Er:Yb-Doped Phosphate Glass |
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277 | (1) |
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10.4.3 Waveguide Amplifier in Er:Yb-Doped Oxyfluoride Silicate Glass |
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278 | (3) |
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10.4.4 Active Waveguides in New Glass Materials |
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281 | (1) |
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281 | (2) |
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10.5.1 Waveguide Lasers in Er:Yb-Doped Phosphate Glass |
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281 | (2) |
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10.5.2 Waveguide Laser in Er:Yb-Doped Oxyfluoride Silicate Glass |
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283 | (1) |
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10.6 Advanced Waveguide Lasers |
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283 | (6) |
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10.6.1 Single-Longitudinal-Mode Operation |
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283 | (5) |
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10.6.2 Mode-Locking Regime |
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288 | (1) |
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10.7 Outlook and Conclusions |
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289 | (6) |
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290 | (5) |
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Part III Waveguides and Optical Devices in Other Transparent Materials |
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11 Waveguides in Crystalline Materials |
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295 | (20) |
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11.1 Origins of Refractive Index Changes |
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295 | (3) |
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11.2 Waveguides Characteristics in Various Crystals |
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298 | (6) |
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11.2.1 Waveguide Fabrication in LiNbO3 |
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299 | (1) |
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300 | (2) |
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11.2.3 Actively Doped Crystals and Ceramics |
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302 | (2) |
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11.3 Nonlinear Properties |
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304 | (2) |
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304 | (2) |
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11.4 Integrated Optical Devices |
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306 | (4) |
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11.4.1 Mach-Zehnder Interferometer |
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306 | (1) |
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11.4.2 Electrooptic Modulator |
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307 | (1) |
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308 | (2) |
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310 | (5) |
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311 | (4) |
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12 Refractive Index Structures in Polymers |
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315 | (36) |
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315 | (1) |
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12.2 Motivation for Refractive Index Structures in Polymers |
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316 | (1) |
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12.3 Laser Photomodification of PMMA |
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317 | (2) |
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12.3.1 Continuous Wave UV Laser Sources |
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317 | (1) |
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12.3.2 Long Pulse (ns, ps) Laser Sources |
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317 | (1) |
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12.3.3 Ultrashort fs Laser Sources |
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318 | (1) |
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12.4 Waveguiding and Positive/Negative Refractive Index |
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319 | (1) |
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320 | (3) |
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12.5.1 Simple Transmission Gratings (2D) |
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321 | (1) |
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12.5.2 Production of Waveguides (1D) |
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322 | (1) |
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323 | (2) |
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12.7 Comparisons of Commercial and Clinical Grade PMMA |
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325 | (1) |
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12.8 Pulse Duration, Wavelength, and Bandgap Dependence of Refractive Index Modification |
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325 | (7) |
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12.8.1 Pulse Duration Dependence of Refractive Index Modification |
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326 | (5) |
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12.8.2 Effect of Bandgap and Wavelength on Refractive Index Modification |
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331 | (1) |
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12.9 Relating Photochemistry to Writing Conditions |
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332 | (4) |
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12.9.1 Size Exclusion Chromatography |
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334 | (1) |
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12.9.2 Thermal Desorption Volatile Analysis |
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334 | (1) |
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12.9.3 Thermogravimetric Analysis |
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334 | (1) |
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12.9.4 Optical Spectroscopy |
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335 | (1) |
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12.9.5 Etching of Structures |
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335 | (1) |
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12.9.6 Summary of Photochemical Analysis |
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336 | (1) |
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12.10 Effect of Self-Focusing |
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336 | (3) |
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339 | (1) |
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12.12 Parallel Processing Using Spatial Light Modulator |
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340 | (2) |
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12.13 Applications of Refractive Index Structures in Polymers |
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342 | (1) |
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12.13.1 Polymer Optical Fibre Sensors and Devices |
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343 | (1) |
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343 | (8) |
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344 | (7) |
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Part IV Microsystems and Applications |
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13 Discrete Optics in Femtosecond Laser Written Waveguide Arrays |
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351 | (38) |
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13.1 Introduction to Waveguide Arrays |
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351 | (2) |
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13.2 Fundamental Principles of Discrete Light Propagation |
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353 | (2) |
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13.3 Basic Experimental Techniques |
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355 | (3) |
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13.3.1 Evanescent Coupling |
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355 | (1) |
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13.3.2 Waveguide Imaging Microscopy |
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356 | (1) |
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13.3.3 Multi-waveguide Excitation |
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357 | (1) |
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13.4 Linear Propagation Effects |
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358 | (15) |
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358 | (7) |
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365 | (5) |
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13.4.3 Quantum-Mechanical Analogies |
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370 | (3) |
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13.5 Nonlinear Propagation Effects |
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373 | (12) |
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13.5.1 Nonlinear Refractive Index |
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373 | (1) |
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13.5.2 One-Dimensional Solitons |
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374 | (7) |
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13.5.3 Two-Dimensional Solitons |
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381 | (4) |
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385 | (4) |
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386 | (3) |
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389 | (32) |
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389 | (3) |
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14.2 Femtosecond Laser Microfluidic Channel Fabrication |
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392 | (8) |
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14.2.1 Fundamental Physical Mechanisms |
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392 | (2) |
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14.2.2 Microchannel Properties |
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394 | (4) |
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14.2.3 Integration of Optical Waveguides and Microfluidic Channels |
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398 | (2) |
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14.3 Integration of Photonic Sensors in LOCs |
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400 | (9) |
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400 | (2) |
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14.3.2 Microchip Capillary Electrophoresis |
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402 | (3) |
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14.3.3 Label-Free Sensing with Mach-Zehnder Interferometers |
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405 | (4) |
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14.4 Femtosecond Laser Fabrication of Optofluidic Devices |
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409 | (7) |
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409 | (2) |
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14.4.2 Label-Free Sensing with Bragg Gratings |
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411 | (2) |
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14.4.3 Cell Trapping and Stretching |
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413 | (3) |
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14.5 Outlook and Conclusions |
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416 | (5) |
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417 | (4) |
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15 Microstructuring of Photosensitive Glass |
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421 | (22) |
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421 | (1) |
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15.2 Photosensitive Glass |
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422 | (6) |
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422 | (2) |
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15.2.2 Microstructuring Procedure |
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424 | (1) |
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15.2.3 Microstructuring Mechanism |
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425 | (3) |
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15.3 Fabrication of Microfluidic Structures |
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428 | (2) |
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15.4 Fabrication of Micro-Optic Structures |
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430 | (3) |
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430 | (1) |
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15.4.2 Optical Waveguides |
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431 | (1) |
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15.4.3 Integration of Optical Microcomponents |
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432 | (1) |
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15.5 Fabrication of Microchip Devices |
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433 | (6) |
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15.5.1 Microfluidic Dye Laser |
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433 | (2) |
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435 | (1) |
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436 | (3) |
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439 | (4) |
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439 | (4) |
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16 Microsystems and Sensors |
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443 | (24) |
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443 | (1) |
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16.2 Micro- and Nano-Systems |
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444 | (2) |
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16.2.1 A Brief Overview of Microsystems |
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444 | (1) |
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16.2.2 Issues on Microsystems Integration and Fabrication |
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444 | (2) |
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16.3 Microsystems Fabricated Using Femtosecond Lasers: Review and State of the Art |
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446 | (2) |
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16.3.1 Specificities of Femtosecond Laser-Matter Interaction from the View-Point of Microsystems Design |
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446 | (1) |
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16.3.2 Integrated Optics Devices |
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447 | (1) |
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448 | (1) |
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16.3.4 Micromechanical Functionality |
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448 | (1) |
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16.4 Multifunctional Monolithic System Integration |
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448 | (16) |
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448 | (1) |
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16.4.2 Taxonomy of Individual Elements Used in a Monolithic Design |
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449 | (7) |
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16.4.3 System Integration: Design Strategies and Interfacing |
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456 | (1) |
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16.4.4 Illustration: Micro-Displacement Sensors and Micro-Force Sensors |
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456 | (8) |
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16.5 Summary, Benefits, Future Prospects, and Challenges |
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464 | (3) |
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464 | (3) |
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17 Ultrashort Laser Welding and Joining |
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467 | (12) |
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467 | (1) |
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468 | (1) |
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17.3 Ultrashort Laser Welding of Transparent Materials |
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469 | (5) |
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17.3.1 Ultrashort Laser Welding with Low-Repetition Rate |
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469 | (4) |
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17.3.2 Ultrashort Laser Welding with High-Repetition Rate |
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473 | (1) |
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17.4 Outlook and Conclusions |
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474 | (5) |
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476 | (3) |
Index |
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479 | |