This reference book concentrates on microstructuring surfaces of optical materials with directed fluxes of off-electrode plasma generated by high-voltage gas discharge and developing methods and equipment related to this technique. It covers theoretical and experimental studies on the electrical and physical properties of high-voltage gas discharges used to generate plasma outside an electrode gap. A new class of methods and devices that makes it possible to implement a series of processes for fabricating diffraction microstructures on large format wafers is also discussed.
Forming Directed Fluxes of Low Temperature Plasma with High Voltage Gas
Discharge Outside the Electrode Gap. Overview of Devices Used for Generating
Low-Temperature High Voltage Gas-Discharge Plasma. Features of
Low-Temperature Off-Electrode Plasma Generated by High Voltage Gas Discharge.
Design Changes to the High-Voltage Gas-Discharge Device. New Devices for
Generating Directed Fluxes of Low-Temperature Off Electrode Plasma. Multibeam
Gas-Discharge Plasma Generator.
Chapter Summay. Methods for Quickly Measuring
Surface Cleanliness. Overview of Methods for Quickly Measuring Surface
Cleanliness. The Method of Frustrated Multiple Internal Reflection
Spectroscopy. The Method of Measuring the Volta Potential. Methods for
Evaluating Cleaning Efficiency Based. On Wettability of the Substrate
Surface. The Tribometric Method. Design Changes to the Tribometer. Operating
Regimes and Parameters of the Tribometer. Determining the Evaluation
Criterion of a Technologically Clean Surface. Tribometric Effect of the
Substrate-Probe on the Structure of the Test Surface. Measuring Surface
Cleanliness with the Tribometric Method . A Cleanliness Analyser Based on
Analysis Of Drop Behavior. Evaluating the Cleanliness of a Substrate from the
Dynamic State Of a Liquid Drop Deposited on Its Surface. Specifications of
the Micro- and Nanoroughness Analyser. Design Changes to the Micro- and
Nanoroughness Analysis.
Chapter Summary. Increasing the Degree of Surface
Cleanliness with Low-Temperature off Electrode Plasma. Overview of Methods
for Surface Cleaning. Chemical Cleaning. Laser Cleaning. Low-Temperature
Plasma Cleaning. Formation Mechanisms of Surface Properties. Molecular
Structure Analysis of the Organic Contaminant. Preparing Initial Samples with
a Given Degree of Contamination. Analysis of Plasma Particles Impinging on
the Surface Being Treated. Mechanism of Surface Cleaning with Directed Fluxes
of Low-Temperature Off-Electrode Plasma. Cleaning Mechanisms. Cleaning
ModelPrimary E
VSEVOLOD KOLPAKOV is a doctor of physics and mathematics and a professor in the Department of Electronic Engineering and Technology at the Samara National Research University (Samara State Aerospace University), Samara, Russia. He is an expert in ionplasma technology and quality management, the author and co-author of 120 scientific publications, including 3 monographs, 2 textbooks, and 40 articles, and a co-inventor of 9 patents.
NIKOLAY KAZANSKIY is head and acting director of the Diffractive Optics Laboratory at the Image Processing Systems Institute and a professor in the Technical Cybernetics Department at the Samara National Research University (Samara State Aerospace University), Samara, Russia. He is a member of SPIE and IAPR, the author and co-author of 240 articles and 10 monographs, and a co-inventor of 46 patents in diffractive optics, mathematical modelling, and nanophotonics.
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